visible & infrared interferometers & accessories
thermal imaging & thermography
non-contact 3D and thickness measurement
systems for distance & thickness measurement
optical test instruments
standard test charts & custom designed reticles
optical components & optomechanical assemblies
high precision motion & control systems
high speed, multichannel, self-calibrating streak cameras
microlens arrays & micro-optical components & structures
High power laser beam delivery systems
Pre-owned optical test equipment for sale
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WaveMasterŪ PRO
WaveMasterŪ PRO and WaveMasterŪ PRO Wafer have been designed to meet the
requirements for high volume production testing of imaging systems, single lenses or lenses on wafers.
The instruments provide an accurate, reliable and fast way for automatic production testing.
With the combination of a fast, high accuracy wavefront sensor and special positioning algorithms
a high throughput is achieved.
WaveMasterŪ PRO comes with a tray system in which a high number of single lenses is
arranged. In contrast to WaveMasterŪ PRO, the WaveMasterŪ PRO Wafer comprises
a special tray system for wafers with a diameter of up to 12 inch and an additional tool which
determines the wafer orientation in the instrument. The tray systems of both instruments allow for
fully automatic positioning of the lenses during the measurement process.
WaveMasterŪ PRO and WaveMasterŪ PRO Wafer provide lateral resolved information
from design or reference data, scratches and lens impurities within a measurement time of less
than three seconds for each single lens under test. This allows for direct feedback into the
large volume production process. The production software enhances the capabilities of all WaveMasterŪ PRO
instruments proving production specific features like pass / fail classification.
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Advantages of WaveMasterŪ PRO and PRO Wafer
High throughput due to high measurement speed and fully automatic batch wise or wafer measurement
High spatial resolution for extremely accurate measurements
Point light sources with different numerical apertures (up to NA 0.95) and working distances
Easy loading due to kinematic mount
Automatic, high precision linear positioning
Measurement either relative or absolute, allows for comparison with a master lens or design data
Maximum utilization of the sensor dynamic range with a set of telescopes
Full functionality of wavefront analysis and detailed analysis of single lenses and wafer lenses
Production software module, for example with export of pass/fail matrix for use in adjacent production line machines
Robust and vibration insensitive main frame
Flange focal length measurement (FFL)
Wafer bow compensation
Wafer orientation measurement tool
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  © 2006 Armstrong Optical Ltd
   |   tel: +44 (0) 1604 654220
   |  e: info@armstrongoptical.co.uk
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